Wet etching consists of the use of the chemical solution (the etchant) toremove material from the surface of a sample. Etching of silicon is the most prominent methods to fabricate different structures for application in microelectromechanical systems and nanoelectromechanical systems based sensors and actuators. Another major advantage of wet etching is the ability of batch fabrication which makes it popular for industrial fabrication. Etching rate and type depend on many factors like i.e. type of the etchant (acidic vs alkaline) or the crystal structure of the substrate.
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